Study of the optical properties of SiO2, and Al2O3 films deposited by electron beam technique

Authors

  • Reza Shakouri Imam khomeini international university, Qazvin, Iran Tel : +98 (28) 33780021 Fax : +98 (28) 33780084

DOI:

https://doi.org/10.24297/jap.v9i3.1347

Keywords:

packing density, absorption, refractive index

Abstract

Al2O3 and SiO2 thin films have been prepared by electron beam evaporation at different oxygen flows. The influences of oxygen partial pressure on optical properties of Al2O3 and SiO2 thin films have been studied. We have coated Al2O3 and SiO2 without some oxygen background in the chamber. The results show that Al2O3 thin film does not have absorption even though it is coated without oxygen background in the chamber. On the other hand, without oxygen flow, SiO2 thin film has some absorption. The packing density of the samples is studied by change in the spectrum of a coating with humidity

Downloads

Download data is not yet available.

Author Biography

Reza Shakouri, Imam khomeini international university, Qazvin, Iran Tel : +98 (28) 33780021 Fax : +98 (28) 33780084

Physics  Department

Downloads

Published

2015-07-23

How to Cite

Shakouri, R. (2015). Study of the optical properties of SiO2, and Al2O3 films deposited by electron beam technique. JOURNAL OF ADVANCES IN PHYSICS, 9(3), 2453–2460. https://doi.org/10.24297/jap.v9i3.1347

Issue

Vol. 9 No. 3

Section

Articles

License

Creative Commons License All articles published in Journal of Advances in Linguistics are licensed under a Creative Commons Attribution 4.0 International License.