Manimuthu, V., M. Arivanandhan, Y. Hayakawa, and H. Ikeda. “Reduction of the Surface Roughness of Ge-on-Insulator Layers up to Sub-Nanometer Range by Chemical Mechanical Polishing”. JOURNAL OF ADVANCES IN PHYSICS, vol. 11, no. 10, June 2016, pp. 4088-92, doi:10.24297/jap.v11i8.6821.