Metwaly, K. H., A. H. Saudy, and F. F. El-Akshar. “Properties of Copper Nitride Thin Films Deposited Using a Pulsed Hollow Cathode Discharge”. JOURNAL OF ADVANCES IN PHYSICS, vol. 12, no. 3, Oct. 2016, pp. 4400-4, doi:10.24297/jap.v12i3.54.