SHAKOURI, R. Study of the optical properties of SiO2, and Al2O3 films deposited by electron beam technique. JOURNAL OF ADVANCES IN PHYSICS, [S. l.], v. 9, n. 3, p. 2453–2460, 2015. DOI: 10.24297/jap.v9i3.1347. Disponível em: https://rajpub.com/index.php/jap/article/view/1347. Acesso em: 19 may. 2024.