RAAIF, M. Constructing and Characterizing TiAlN Thin Film by DC. Pulsed Magnetron Sputtering at Different Nitrogen/Argon Gas Ratios. JOURNAL OF ADVANCES IN PHYSICS, [S. l.], v. 14, n. 2, p. 5638–5652, 2018. DOI: 10.24297/jap.v14i2.7542. Disponível em: https://rajpub.com/index.php/jap/article/view/7542. Acesso em: 23 nov. 2024.