MANIMUTHU, V.; ARIVANANDHAN, M.; HAYAKAWA, Y.; IKEDA, H. Reduction of the surface roughness of Ge-on-insulator layers up to sub-nanometer range by chemical mechanical polishing. JOURNAL OF ADVANCES IN PHYSICS, [S. l.], v. 11, n. 10, p. 4088–4092, 2016. DOI: 10.24297/jap.v11i8.6821. Disponível em: https://rajpub.com/index.php/jap/article/view/6821. Acesso em: 22 nov. 2024.