METWALY, K. H.; SAUDY, A. H.; EL-AKSHAR, F. F. Properties of Copper nitride thin films deposited using a pulsed hollow cathode discharge. JOURNAL OF ADVANCES IN PHYSICS, [S. l.], v. 12, n. 3, p. 4400–4404, 2016. DOI: 10.24297/jap.v12i3.54. Disponível em: https://rajpub.com/index.php/jap/article/view/54. Acesso em: 21 nov. 2024.